Home       Deutsch       PLANSEE EXPRESS       Products from A to Z
    
 
 
 
 
 
 
 





Ion Implantation

Refractory metal parts for ion implantation The implantation of ions is a key technology in the doping of Si wafers, in the manufacture of components in microelectronics  and thin film transistors. PLANSEE manufactures ionisation chambers made of molybdenum or tungsten.

PLANSEE supplies:

  • Ionisation chambers and chamber components made of W, WL or Mo
  • Cathodes and anodes made of W
  • Apertures and other components subject to wear in the chamber and the beam tunnel made of Mo and WL
  • Connection and retention elements such as pins, gas pipes and screws, in Mo, W, WL or Ta
  • Radiation shieldings/crucibles





back



Print Version