The implantation of ions is a key technology in the doping of Si wafers, in the manufacture of components in microelectronics  and thin film transistors. PLANSEE manufactures ionisation chambers made of molybdenum or tungsten.

PLANSEE supplies:

• Ionisation chambers and chamber components made of W, WL or Mo
• Cathodes and anodes made of W
• Apertures and other components subject to wear in the chamber and the beam tunnel made of Mo and WL
• Connection and retention elements such as pins, gas pipes and screws, in Mo, W, WL or Ta
• Radiation shieldings/crucibles