As sharp as you can get. Molybdenum sputtering targets.
|Molybdenum coatings are the crucial components of the thin-film transistors used in TFT-LCD screens. These provide instantaneous control of the individual image dots (pixels) and consequently ensure particularly sharp image quality.|
In the magnetron sputtering method tiny metal particles are vaporized from the sputtering targets and are then deposited as a thin film on the glass substrate. In this fast, economical coating process, all the materials must meet the highest quality criteria. You can rely on our molybdenum sputtering targets:
There's none cleaner.
|No targets are cleaner than ours. The most important benefits: your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process.||
Because: Metallic and gaseous impurities in the sputtering target are reproduced almost 1:1 in the sputtered functional layer and result in particle formation during the PVD process (arcing effect). We guarantee that our molybdenum targets have a purity of at least 99.97 %. The average purity of our targets lies at an unbeatable 99.99 %. The typical oxygen content is 6
You want the perfect coating? We create it.
And naturally, our application laboratory is also available to you for your target and coating tests. We will coat test substrates using the RF, DC or pulsed DC sputtering methods in line with your specifications. The best proof of our expertise is us! We coat many of our products such as semiconductor base plates and x-ray targets in-house using the PVD, CVD, APS and VPS coating processes.
Planar molybdenum targets.
- Extremely pure
- Maximum density
- Uniform microstructure
|You can choose between our single and multi-piece planar targets, which we will be delighted to bond for you in-house. We produce planar sputtering targets for all commonly used systems as well as to specific customer needs.|
Maximized material utilization:
Rotary molybdenum targets.
You can also test our monolithic rotary targets which do not require a backing tube. These are less sensitive to temperature and can be sputtered at extremely high power densities of up to
|Monolithic sputtering target||Used monolithic target|
Monolithic targets now with ID-coating.
One source for all your needs.
Sintering is the cornerstone of our powder metallurgical production process. This is the method we use to manufacture compact metallic components from porous powder blanks. With the world's largest hot rolling mill for refractory metals, we produce planar targets of maximum density. We use special forming processes to manufacture our rotary targets.
Sure and certain.
|Since 1921, our customers have been able to rely on PLANSEE as an independent private company. For our customers and for us, reliability and continuity is particularly important when it comes to the supply of raw materials. With Global Tungsten & Powders (GTP) and its interest in Molibdenos y Metales (Molymet), the Plansee Group covers every step of the molybdenum and tungsten processing – from powder production through powder-metallurgical processes to serving customers with semi-finished and tailor-made components.|
We have something else for you.
And that's not everything. Molybdenum and tungsten withstand the highest temperatures and aggressive chemicals. We use these materials to manufacture system components for every step in the process chain: Shieldings, evaporation boats, hot zones, formed crucibles, pressed-sintered crucibles, glass melting electrodes and many other components.
Why wait? Our ribbons, sheets, rods and wires manufactured from refractory metals are available for order online right now. Take a look: www.plansee-express.com