Perfectly metallized. Aluminum sputtering targets.

Aluminum possesses very high electrical conductivity. Together with molybdenum, it is used for metallization in thin-film transistors for TFT-LCD monitors, television sets and cell phone displays.

The most important details at a glance
Density [g/cm3] > 2,70
Purity [%] > 99,999 (5N)
Hardness [HV1]16
Thermal conductivity [W/(m·K)]238

High purity.

With a purity of 5N our aluminum sputtering targets are simply the best. Why is that so important to us? Impurities in sputtering targets impair the conductivity of the material. Particles of chromium, manganese, magnesium, silicon, iron and tin are particularly critical. But there's no cause for alarm: Any residual impurities are minimal. They are present only in concentrations well below the critical threshold values.

Purity aluminum sputtering targets
Typical concentration of impurities

Homogeneous microstructure.

Our aluminum targets have a particularly fine-grained microstructure. This ensures that you benefit from uniform erosion and a low susceptibility to particle formation throughout the sputtering process.

Superior surface quality.

Aluminum is a particularly soft material. To make sure that the surfaces of our aluminum targets reach you in perfect condition, we take additional care during the machining and packaging of our products.

Your contact person
Your contact Person for:
Paul Rudnik
Give me a call:
+ 1 508 446-1405
or send an Email:
Paul Rudnik