Online ShopMy Plansee
The Plansee Group
Homepage
Online ShopMy PlanseePlansee Group
Ion implantation

Components and spare parts for ion implantation

Ion implantation is an important process in the production of semiconductors. Implanter systems dope wafers with foreign atoms to modify material properties such as conductivity or crystal structure. The beam path is the center of an implanter system. Here the ions are generated, concentrated, greatly accelerated, and focused on the wafer at very high speeds.

Our components and spare parts made from refractory metals help to ensure that this process is as efficient, precise, and free of impurities as possible.

Your advantages at a glance:

  • Over 30 years experience in the semiconductor industry

  • Production precisely according to manufacturer standards

  • Highest product quality

Ideal product properties

Temperatures up to 1400°C, strong electro-magnetic fields, aggressive process gases, and high mechanical forces are a problem for regular materials. Not so with our products. Our heat resistant components made from molybdenum, tungsten, graphite, or ceramics offer the ideal combination of corrosion resistance, material strength, good thermal conductivity, and absolute purity. One hundred or more Plansee components are used per beam path. They ensure that the ions are generated efficiently and are focused precisely on the wafer in the beam path without any impurities.

Beamline

With accuracy down to one thousandth of a millimeter and with more than 30 years of experience in the semiconductor industry, our production sites in Japan and USA precisely meet manufacturer standards as well as develop our components even further. After all, Plansee spare parts are becoming more and more than just a replacement for our customers. We start with the original spare parts from the system manufacturer and then optimize the geometries and material compositions. What you get:

  • Easier installation and removal of components
  • Longer service life
  • Lower cleaning costs
  • Lower maintenance effort
  • Fewer downtimes

We know how important reproducible quality is for your process. And that is why our quality is excellent. Over and over again. How do we do this? We have been producing high-performance materials since 1921 and we keep the entire production process in-house from the metal powder to the finished product. We only allow implanter parts that meet our strict quality control checks to leave our facilities.

Our products

  • Chambers (graphite, tungsten, molybdenum and alloys)
  • Filaments (tungsten and tungsten alloys)
  • Blades (graphite, tungsten, molybdenum and alloys)
  • Brackets (tungsten, molybdenum and alloys)
  • Cathodes (tungsten, molybdenum and alloys)
  • Terminals (graphite)
  • Analyzer parts (graphite)
  • Insulators (ceramics)
  • Spare parts (graphite, tungsten, molybdenum and alloys, ceramics, steel)
Ion implanter
  • slideplansee-aem/components/imageSlide81949124
  • slideplansee-aem/components/imageSlide81949126
  • slideplansee-aem/components/imageSlide81949128
  • slideplansee-aem/components/imageSlide81949130

Spare parts specialist for over 100 systems

Whether an old model or next generation, medium or high current: we know them all and naturally have the right spare parts for you in our range. Would you like to get more out of your ion implanter? Get in touch. Even if you can't find your system on the list.

AIBT: istar

Applied Materials: 9000, 9200, 9200xR, 9500, 9500xR, Quantum, Quantum I, Quantum II, Quantum III, Quantum X, Quantum X+, Quantum xR, xR, xR/Leap, xR120, xR200, xR80

Varian Semiconductor Equipment (now Applied Materials): VIISta Trident, PLAD, VIISta HCS, VIISta HCP +/I, VIISta 80, E1000, VIISion 200, VIISion 200+, VIISion 80+, VIISta HC, 120-10, 120XP, 160XP, 180XP, 80XP, VIISta 3000, Genus, Kestrel, VIISta 810 XE/XER, VIISta 900 XPT, VIISion, E220, E500, VIISta 810, VIISta 810 XE, VIISta 900, VIISta 900XP, 300D, 300XP, 350D

Axcelis: GSD HC (200/200E/200E2), HC3, Ultra, Eterna, GSD 100, GSD 160A, GSD 200E, GSD 200E^2, GSD HC, GSD HC3, GSD III, GSD III LE, GSD LED, NV GSD, NV 10-160, NV 10-180, NV 10-80, Optima HD, ULE, Ultra, GSD HE, GSD VHE, GSD HE, GSD HE3, GSD VHE, Optima XE, Paradigm XE, NV 3206/3204, NV 6200, NV 8200, NV 8250, Optima MD

Nissin: NH80, PR80, Exceed 3000, CLARIS, EXCEED2000A/2000AH, EXCEED2300AV, EXCEED3000AH, EXCEED9600A, NH20, NH45

SEN: NV-GSD-160A, NV-GSD-80A, NV-GSDIII, NV-GSDIII-180, SD, NV-GSDIII-90E, NV-GSDIII-LE, NV-GSDIII-LE, V-GSD-HC, LEX, LEX3, SHX, NV-GSD-HE, NV-GSD-HE3, MC3MC3-II, NV-MC3

Ulvac: IH-860, IDZ-7000, IDZ-8001, IDZ-9001, IM-200, IW-630

Try out our online product catalog. There you will find several of our OEM-quality implanter spare parts as well as components designed by Plansee for improve service life and easy handling. Our product catalog offers additional features for existing customers, where you can view your orders, delivery status, and invoices.

Contact us at ionimplantation(at)plansee.com for your personal login.

To the product catalog for ion implanter parts

Cost savings with Plansee

Whenever we see an opportunity to raise standards and save the customer time and money, we will offer advanced standard solutions. We start with the original spare parts from the system manufacturer and then optimize the geometries and material compositions. Would you like to put us to the test? We'll be happy to oblige. You will receive improved spare parts to try out at a very economical price. This way you can be absolutely certain.

MRS plate according to the OEM standard

The MRS vane filters out the ions in the IIP process that no longer have the correct charge or mass. Only the ions that pass through the mass resolution slot continue on their path to the wafer. The MRS vane is exposed to abrasion caused by the collision of the ion beam. An angle at the side facet minimizes this abrasion. However, the IIP process also involves chemical reactions and wear that are all the greater, the more acute the angles at the relevant surfaces are. By way of compromise, an angle of 92° is used in the OEM standard part.

Improved design for a longer service life

But we are not content to make compromises and have further improved the original part: to do this, we construct the area where the ion beam impacts with the greatest force almost as a right angle. In contrast, the areas at the edge – which are primarily affected by chemical and thermal reactions – are made with only shallow angles.

The material is not the same material

To make sure that our customers are supplied with the perfect product, we are also very fussy about the materials we use. Conventional graphite is extremely coarse-grained and can cause high levels of particle formation during the process. For manufacturers of electrical components involving particularly small-scale structures, this type of impurity can cause major problems. We offer our customers a particularly hard, robust graphite. It is significantly less vulnerable to abrasion and consequently reduces the formation of particles during the process. And the improvements we make at Plansee bring great benefits for our customers. Advanced Standard MRS vanes last up to three times longer than conventional OEM models.

Interested? We are here for you.

An idea is only as good as the way it is put into practice. Tell us what challenge you are facing. Our IIP specialists are on the job worldwide. You need us directly on site? That's not a problem. We'll be there in less than 48 hours. Guaranteed!