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Molybdenum rotary sputtering targets

Molybdenum monolithic rotary sputtering targets

Coating material in the form of molybdenum sputtering targets is used in the production of molybdenum layers for CIGS back contacts or thin-film transistors in flat screens (TFT LCD, OLED). Monolithic rotary targets have no backing tube and therefore consist of 100% coating material. These targets increase the sputtering performance considerably and thereby enable a higher throughput to be achieved. The increased material yield in comparison with bonded rotary targets therefore also reduces manufacturing costs in the coating process.

Your advantages at a glance:

  • High metallic purity
    > 99.97%

  • High density
    > 99.5%

  • Homogeneous microstructure

  • High production throughput and yields possible

Download our product specifications:

Mo rotary sputtering target specification (monolithic)

Internal coating for monolithic rotary targets

Mo rotary sputtering target

When using monolithic targets, molybdenum comes into direct contact with the cooling water from the coating system. Usually, the cooling water is prepared for the use of monolithic targets with suitable additives, so-called inhibitors. These stabilize the pH value of the cooling water and prevent the molybdenum from corroding. A patent-pending polymer-based internal coating from Plansee, which has been specially developed for monolithic rotary targets, prevents direct contact between the coating material and the cooling water. This is a huge advantage, as it means considerably fewer inhibitors are required in the production of CIGS solar cells and TFT LCD screens, thereby saving costs. The durable internal coating is so thin that it does not noticeably affect the thermal conductivity of the rotary target and continues to guarantee excellent sputtering performance.

More about the advantages of monolithic rotary sputtering targets:

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